Datum
2022-01-29Schlagwort
620 Ingenieurwissenschaften 660 Chemische Verfahrenstechnik, Technische Chemie Nanostrukturiertes MaterialDünne SchichtMaterialermüdungWiderstand <Elektrotechnik>RissMetadata
Zur Langanzeige
Aufsatz
Linking through-thickness cracks in metallic thin films to in-situ electrical resistance peak broadening
Zusammenfassung
Measurements of electrical resistance have been used extensively as a failure criterion in cyclically loaded conductive films. However, not much research has been performed on extracting additional information contained within such resistance data sets. This study shows that an increase in peak width evidences a transition from cracks bridging to through-thickness crack formation. A Au/Cr bilayer system on a polyimide substrate is used for data generation but the method is applicable to any material system where both necking and through-thickness cracks are formed and no immediate formation of electrically insulating oxide layers occurs upon damage initiation. The method is easy to implement, and has the ability to replace time-intensive and destructive inspection methods.
Zitierform
In: Scripta Materialia Volume 212 (2022-01-29) eissn:1872-8456Förderhinweis
his work was supported by the Austrian Science Fund (FWF) [Project I 4384-N] and the German Research Foundation (DFG) [grant ME-4368/8] within the framework of the D-A-CH cooperation FATIFACE.Zitieren
@article{doi:10.17170/kobra-202308018550,
author={Gebhart, David D. and Krapf, Anna and Gammer, Christoph and Merle, Benoit and Cordill, Megan J.},
title={Linking through-thickness cracks in metallic thin films to in-situ electrical resistance peak broadening},
journal={Scripta Materialia},
year={2022}
}
0500 Oax 0501 Text $btxt$2rdacontent 0502 Computermedien $bc$2rdacarrier 1100 2022$n2022 1500 1/eng 2050 ##0##http://hdl.handle.net/123456789/14967 3000 Gebhart, David D. 3010 Krapf, Anna 3010 Gammer, Christoph 3010 Merle, Benoit 3010 Cordill, Megan J. 4000 Linking through-thickness cracks in metallic thin films to in-situ electrical resistance peak broadening / Gebhart, David D. 4030 4060 Online-Ressource 4085 ##0##=u http://nbn-resolving.de/http://hdl.handle.net/123456789/14967=x R 4204 \$dAufsatz 4170 5550 {{Nanostrukturiertes Material}} 5550 {{Dünne Schicht}} 5550 {{Materialermüdung}} 5550 {{Widerstand <Elektrotechnik>}} 5550 {{Riss}} 7136 ##0##http://hdl.handle.net/123456789/14967
2023-08-02T10:21:47Z 2023-08-02T10:21:47Z 2022-01-29 doi:10.17170/kobra-202308018550 http://hdl.handle.net/123456789/14967 his work was supported by the Austrian Science Fund (FWF) [Project I 4384-N] and the German Research Foundation (DFG) [grant ME-4368/8] within the framework of the D-A-CH cooperation FATIFACE. eng Namensnennung 4.0 International http://creativecommons.org/licenses/by/4.0/ nanocrystalline metal thin films fatigue electrical resistivity through-thickness cracks 620 660 Linking through-thickness cracks in metallic thin films to in-situ electrical resistance peak broadening Aufsatz Measurements of electrical resistance have been used extensively as a failure criterion in cyclically loaded conductive films. However, not much research has been performed on extracting additional information contained within such resistance data sets. This study shows that an increase in peak width evidences a transition from cracks bridging to through-thickness crack formation. A Au/Cr bilayer system on a polyimide substrate is used for data generation but the method is applicable to any material system where both necking and through-thickness cracks are formed and no immediate formation of electrically insulating oxide layers occurs upon damage initiation. The method is easy to implement, and has the ability to replace time-intensive and destructive inspection methods. open access Gebhart, David D. Krapf, Anna Gammer, Christoph Merle, Benoit Cordill, Megan J. doi:10.1016/j.scriptamat.2022.114550 I 4384-N, ME-4368/8 Nanostrukturiertes Material Dünne Schicht Materialermüdung Widerstand <Elektrotechnik> Riss publishedVersion eissn:1872-8456 Scripta Materialia Volume 212 false 114550
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