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Now showing items 131-140 of 333
Dissertation
Polarisation von Licht im Physikunterricht : ein Elementarisierungsansatz zur Einführung in quantenphysikalische Begriffe und Prinzipien
(2004-12-09)
In der vorliegenden Arbeit wird ein Unterrichtskonzept für die gymnasiale Oberstufe beschrieben, das anhand der Polarisationseigenschaft des Lichts von der Beobachtung ausgehend einen Zugang zur Quantenphysik ermöglicht. Die Unterrichtsinhalte bauen so aufeinander auf, dass ein "harter Bruch" zwischen der klassischen und der quantenphysikalischen Beschreibung von Licht vermieden wird. Das methodische Vorgehen des Unterrichtskonzeptes führt vom Phänomen ausgehend zu quantitativen Experimenten hin zu einer Einführung ...
Aufsatz
Photoionization of Kr 4s: III. Detailed and extended measurements of the Kr 4s-electron ionization cross section
(1994)
Absolute Kr 4s-electron photoionization cross sections as a function of the exciting-photon energy were measured by photon-induced fluorescence spectroscopy (PIFS) at improved primary-energy resolution. The cross sections were determined from threshold to
33.5 eV and to 90 eV with primary-photon bandwidths of 25 meV and 50 meV, respectively. The measurements were compared with experimental data and selected theoretical calculations for the direct Kr 4s-electron photoionization cross sections.
Dissertation
Piezoresistive cantilevers with an integrated bimorph actuator
(2004-07-26)
Scanning Probe Microscopy (SPM) has become of fundamental importance for research in area of micro and nano-technology. The continuous progress in these fields requires ultra sensitive measurements at high speed. The imaging speed limitation of the conventional Tapping Mode SPM is due to the actuation time constant of piezotube feedback loop that keeps the tapping amplitude constant. In order to avoid this limit a deflection sensor and an actuator have to be integrated into the cantilever. In this work has been ...
Dissertation
Lithography-free micro- and nanostructuring based on conventional plasma etching
(2005-02-02)
In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, ...