Date
2017-01-11Metadata
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Dissertation
Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays
(Entwicklung, Evaluierung und Optimierung von Herstellungsprozessen für mikrospiegelbasierte Lichtlenksysteme)
Abstract
In this work, fabrication processes for daylight guiding systems based on micromirror arrays are developed, evaluated and optimized.Two different approaches are used: At first, nanoimprint lithography is used to fabricate large area micromirrors by means of Substrate Conformal Imprint Lithography (SCIL).Secondly,a new lithography technique is developed using a novel bi-layered photomask to fabricate large area micromirror arrays. The experimental results showing a reproducible stable process, high yield, and is consuming less material, time, cost and effort.
Citation
@phdthesis{urn:nbn:de:hebis:34-2017011151880,
author={Al-Qargholi, Basim},
title={Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays},
school={Kassel, Universität Kassel, Fachbereich Elektrotechnik / Informatik},
month={01},
year={2017}
}
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3000 Al-Qargholi, Basim
4000 Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays
:Entwicklung, Evaluierung und Optimierung von Herstellungsprozessen für mikrospiegelbasierte Lichtlenksysteme / Al-Qargholi, Basim
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5550 {{Spiegelsystem}}
5550 {{Array}}
5550 {{Silicium}}
5550 {{Fotoleiter}}
7136 ##0##urn:nbn:de:hebis:34-2017011151880
<resource xsi:schemaLocation="http://datacite.org/schema/kernel-2.2 http://schema.datacite.org/meta/kernel-2.2/metadata.xsd"> 2017-01-11T08:48:44Z 2017-01-11T08:48:44Z 2017-01-11 urn:nbn:de:hebis:34-2017011151880 http://hdl.handle.net/123456789/2017011151880 eng Urheberrechtlich geschützt https://rightsstatements.org/page/InC/1.0/ micromirrors deposition nanoimprint lithography bi-layered photomask etching photoresist silicon residual layer 530 Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays Dissertation In this work, fabrication processes for daylight guiding systems based on micromirror arrays are developed, evaluated and optimized.Two different approaches are used: At first, nanoimprint lithography is used to fabricate large area micromirrors by means of Substrate Conformal Imprint Lithography (SCIL).Secondly,a new lithography technique is developed using a novel bi-layered photomask to fabricate large area micromirror arrays. The experimental results showing a reproducible stable process, high yield, and is consuming less material, time, cost and effort. open access Entwicklung, Evaluierung und Optimierung von Herstellungsprozessen für mikrospiegelbasierte Lichtlenksysteme Al-Qargholi, Basim Kassel, Universität Kassel, Fachbereich Elektrotechnik / Informatik Hillmer, Hartmut (Prof. Dr.) Bangert, Axel (Prof. Dr.) Lehmann, Peter (Prof. Dr.) Witzigmann, Bernd (Prof. Dr.) Wave propagation in random media Diffraction and scattering Interference Light-sensitive materials Glasses, quartz Visible and ultraviolet sources Spiegelsystem Array Silicium Fotoleiter 2016-10-20 </resource>
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:Urheberrechtlich geschützt