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Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays

dc.date.accessioned2017-01-11T08:48:44Z
dc.date.available2017-01-11T08:48:44Z
dc.date.issued2017-01-11
dc.identifier.uriurn:nbn:de:hebis:34-2017011151880
dc.identifier.urihttp://hdl.handle.net/123456789/2017011151880
dc.language.isoeng
dc.rightsUrheberrechtlich geschützt
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/
dc.subjectmicromirrorseng
dc.subjectdepositioneng
dc.subjectnanoimprint lithographyeng
dc.subjectbi-layered photomaskeng
dc.subjectetchingeng
dc.subjectphotoresisteng
dc.subjectsiliconeng
dc.subjectresidual layereng
dc.subject.ddc530
dc.titleDevelopment, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrayseng
dc.typeDissertation
dcterms.abstractIn this work, fabrication processes for daylight guiding systems based on micromirror arrays are developed, evaluated and optimized.Two different approaches are used: At first, nanoimprint lithography is used to fabricate large area micromirrors by means of Substrate Conformal Imprint Lithography (SCIL).Secondly,a new lithography technique is developed using a novel bi-layered photomask to fabricate large area micromirror arrays. The experimental results showing a reproducible stable process, high yield, and is consuming less material, time, cost and effort.eng
dcterms.accessRightsopen access
dcterms.alternativeEntwicklung, Evaluierung und Optimierung von Herstellungsprozessen für mikrospiegelbasierte Lichtlenksystemeger
dcterms.creatorAl-Qargholi, Basim
dc.contributor.corporatenameKassel, Universität Kassel, Fachbereich Elektrotechnik / Informatik
dc.contributor.refereeHillmer, Hartmut (Prof. Dr.)
dc.contributor.refereeBangert, Axel (Prof. Dr.)
dc.contributor.refereeLehmann, Peter (Prof. Dr.)
dc.contributor.refereeWitzigmann, Bernd (Prof. Dr.)
dc.subject.pacsWave propagation in random mediaeng
dc.subject.pacsDiffraction and scatteringeng
dc.subject.pacsInterferenceeng
dc.subject.pacsLight-sensitive materialseng
dc.subject.pacsGlasses, quartzeng
dc.subject.pacsVisible and ultraviolet sourceseng
dc.subject.swdSpiegelsystemger
dc.subject.swdArrayger
dc.subject.swdSiliciumger
dc.subject.swdFotoleiterger
dc.date.examination2016-10-20


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