Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays

2017-01-112017-01-112017-01-11urn:nbn:de:hebis:34-2017011151880http://hdl.handle.net/123456789/2017011151880engUrheberrechtlich geschützthttps://rightsstatements.org/page/InC/1.0/micromirrorsdepositionnanoimprint lithographybi-layered photomasketchingphotoresistsiliconresidual layer530Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror ArraysDissertationWave propagation in random mediaDiffraction and scatteringInterferenceLight-sensitive materialsGlasses, quartzVisible and ultraviolet sourcesSpiegelsystemArraySiliciumFotoleiter