Development of Selectively Actuatable Micromirror Arrays and Scalable Lithography Processes for Large-Area Applications as Smart Window

2023-04-242023-04-242023http://hdl.handle.net/123456789/14626engUrheberrechtlich geschützthttps://rightsstatements.org/page/InC/1.0/micromirrormicromirror arrayssubfield addressingrow/column addressingpassive matrix schememetal-acid etchTCO patterninginclined UV exposure3D photoresist patterningscalablelarge-area lithographyroll-lithographyMikrospiegelMikrospiegel-ArraysSubfeldadressierungZeilen-/SpaltenadressierungPassivmatrix-AdressierungMetall-Säure-ÄtzprozessTCO-StrukturierungUV Schrägbelichtung3D-Photolackbemusterungskalierbare, großflächige LithografieRollenlithografie004530Development of Selectively Actuatable Micromirror Arrays and Scalable Lithography Processes for Large-Area Applications as Smart WindowDissertationLithografieTageslichtBeleuchtung