2008-08-122008-08-1219920178-76830722-3277urn:nbn:de:hebis:34-2008081223210http://hdl.handle.net/123456789/2008081223210500960 bytesapplication/pdfengUrheberrechtlich geschützthttps://rightsstatements.org/page/InC/1.0/530Influence of the interaction potential on simulated sputtering and reflection dataAufsatz79.20.34.20.