Aufsatz
Fabrication of highly dense arrays of nanocrystalline diamond nanopillars with integrated silicon-vacancy color centers during the growth
Zusammenfassung
Highly dense arrays of diamond nanopillars have been fabricated using nanocrystalline diamond films (NCD) as the starting material. The fabrication process consisted of electron beam lithography (EBL), aluminum mask deposition and inductively coupled O2 plasma reactive ion etching. The EBL pattern fidelity was enhanced by proximity corrections and dose variations. Optical characterizations of the arrays indicated the incorporation of silicon-vacancy centers during NCD growth as well as enhanced fluorescence and photoluminescence intensities in the well-developed pillar arrays. Transferring this fabrication method to monocrystalline diamond, such dense arrays of diamond nanopillars could be applied in quantum photonics as emitter arrays or photonic crystals upon integration of color centers.
Zitierform
In: Optical Materials Express Vol. 9 / Issue 12 (2019-11-06) , S. 4545-4555 ; ISSN 2159-3930Zusätzliche Informationen
© 2019 Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved.Förderhinweis
Gefördert durch den Publikationsfonds der Universität KasselZitieren
@article{doi:10.17170/kobra-20191114782,
author={Schmidt, Alexander and Naydenov, Boris and Jelezko, Fedor and Reithmaier, Johann Peter and Popov, Cyril},
title={Fabrication of highly dense arrays of nanocrystalline diamond nanopillars with integrated silicon-vacancy color centers during the growth},
journal={Optical Materials Express},
year={2019}
}
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2019-11-14T10:32:24Z 2019-11-14T10:32:24Z 2019-11-06 doi:10.17170/kobra-20191114782 http://hdl.handle.net/123456789/11354 © 2019 Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved. Gefördert durch den Publikationsfonds der Universität Kassel eng Urheberrechtlich geschützt https://rightsstatements.org/page/InC/1.0/ 530 620 Fabrication of highly dense arrays of nanocrystalline diamond nanopillars with integrated silicon-vacancy color centers during the growth Aufsatz Highly dense arrays of diamond nanopillars have been fabricated using nanocrystalline diamond films (NCD) as the starting material. The fabrication process consisted of electron beam lithography (EBL), aluminum mask deposition and inductively coupled O2 plasma reactive ion etching. The EBL pattern fidelity was enhanced by proximity corrections and dose variations. Optical characterizations of the arrays indicated the incorporation of silicon-vacancy centers during NCD growth as well as enhanced fluorescence and photoluminescence intensities in the well-developed pillar arrays. Transferring this fabrication method to monocrystalline diamond, such dense arrays of diamond nanopillars could be applied in quantum photonics as emitter arrays or photonic crystals upon integration of color centers. open access Schmidt, Alexander Naydenov, Boris Jelezko, Fedor Reithmaier, Johann Peter Popov, Cyril doi:10.1364/OME.9.004545 publishedVersion ISSN 2159-3930 Issue 12 Optical Materials Express 4545-4555 Vol. 9
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