Datum
2020-05-23Autor
Löber, DennisDey, SubhayanKaban, BurhanRoesler, FabianMaurer, MartinHillmer, HartmutPietschnig, RudolfMetadata
Zur Langanzeige
Aufsatz
3D Micro/Nanopatterning of a Vinylferrocene Copolymer
Zusammenfassung
In nanoimprint lithography (NIL), a pattern is created by mechanical deformation of an imprint resist via embossing with a stamp, where the adhesion behavior during the filling of the imprint stamp and its subsequent detachment may impose some practical challenges. Here we explored thermal and reverse NIL patterning of polyvinylferrocene and vinylferrocene-methyl methacrylate copolymers to prepare complex non-spherical objects and patterns. While neat polyvinylferrocene was found to be unsuitable for NIL, freshly-prepared vinylferrocene-methyl methacrylate copolymers, for which identity and purity were established, have been structured into 3D-micro/nano-patterns using NIL. The cross-, square-, and circle-shaped columnar structures form a 3 × 3 mm arrangement with periodicity of 3 µm, 1 µm, 542 nm, and 506 nm. According to our findings, vinylferrocene-methyl methacrylate copolymers can be imprinted without further additives in NIL processes, which opens the way for redox-responsive 3D-nano/micro-objects and patterns via NIL to be explored in the future.
Zitierform
In: Molecules Volume 25 / Issue 10 (2020-05-23) , S. 2438 ; EISSN 1420-3049Förderhinweis
Gefördert durch den Publikationsfonds der Universität KasselZitieren
@article{doi:10.17170/kobra-202005291311,
author={Löber, Dennis and Dey, Subhayan and Kaban, Burhan and Roesler, Fabian and Maurer, Martin and Hillmer, Hartmut and Pietschnig, Rudolf},
title={3D Micro/Nanopatterning of a Vinylferrocene Copolymer},
journal={Molecules},
year={2020}
}
0500 Oax 0501 Text $btxt$2rdacontent 0502 Computermedien $bc$2rdacarrier 1100 2020$n2020 1500 1/eng 2050 ##0##http://hdl.handle.net/123456789/11577 3000 Löber, Dennis 3010 Dey, Subhayan 3010 Kaban, Burhan 3010 Roesler, Fabian 3010 Maurer, Martin 3010 Hillmer, Hartmut 3010 Pietschnig, Rudolf 4000 3D Micro/Nanopatterning of a Vinylferrocene Copolymer / Löber, Dennis 4030 4060 Online-Ressource 4085 ##0##=u http://nbn-resolving.de/http://hdl.handle.net/123456789/11577=x R 4204 \$dAufsatz 4170 5550 {{Copaxone}} 5550 {{Ferrocen}} 7136 ##0##http://hdl.handle.net/123456789/11577
2020-05-29T12:47:03Z 2020-05-29T12:47:03Z 2020-05-23 doi:10.17170/kobra-202005291311 http://hdl.handle.net/123456789/11577 Gefördert durch den Publikationsfonds der Universität Kassel eng Namensnennung 4.0 International http://creativecommons.org/licenses/by/4.0/ vinylferrocene copolymer methyl methacrylate reverse nanoimprint lithography 530 540 3D Micro/Nanopatterning of a Vinylferrocene Copolymer Aufsatz In nanoimprint lithography (NIL), a pattern is created by mechanical deformation of an imprint resist via embossing with a stamp, where the adhesion behavior during the filling of the imprint stamp and its subsequent detachment may impose some practical challenges. Here we explored thermal and reverse NIL patterning of polyvinylferrocene and vinylferrocene-methyl methacrylate copolymers to prepare complex non-spherical objects and patterns. While neat polyvinylferrocene was found to be unsuitable for NIL, freshly-prepared vinylferrocene-methyl methacrylate copolymers, for which identity and purity were established, have been structured into 3D-micro/nano-patterns using NIL. The cross-, square-, and circle-shaped columnar structures form a 3 × 3 mm arrangement with periodicity of 3 µm, 1 µm, 542 nm, and 506 nm. According to our findings, vinylferrocene-methyl methacrylate copolymers can be imprinted without further additives in NIL processes, which opens the way for redox-responsive 3D-nano/micro-objects and patterns via NIL to be explored in the future. open access Löber, Dennis Dey, Subhayan Kaban, Burhan Roesler, Fabian Maurer, Martin Hillmer, Hartmut Pietschnig, Rudolf doi:10.3390/molecules25102438 Copaxone Ferrocen publishedVersion EISSN 1420-3049 Issue 10 Molecules 2438 Volume 25 false
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