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dc.description© 2019 Optical Society of America. Users may use, reuse, and build upon the article, or use the article for text or data mining, so long as such uses are for non-commercial purposes and appropriate attribution is maintained. All other rights are reserved.ger
dc.description.sponsorshipGefördert durch den Publikationsfonds der Universität Kasselger
dc.rightsUrheberrechtlich geschützt
dc.titleFabrication of highly dense arrays of nanocrystalline diamond nanopillars with integrated silicon-vacancy color centers during the growtheng
dcterms.abstractHighly dense arrays of diamond nanopillars have been fabricated using nanocrystalline diamond films (NCD) as the starting material. The fabrication process consisted of electron beam lithography (EBL), aluminum mask deposition and inductively coupled O2 plasma reactive ion etching. The EBL pattern fidelity was enhanced by proximity corrections and dose variations. Optical characterizations of the arrays indicated the incorporation of silicon-vacancy centers during NCD growth as well as enhanced fluorescence and photoluminescence intensities in the well-developed pillar arrays. Transferring this fabrication method to monocrystalline diamond, such dense arrays of diamond nanopillars could be applied in quantum photonics as emitter arrays or photonic crystals upon integration of color centers.eng
dcterms.accessRightsopen access
dcterms.creatorSchmidt, Alexander
dcterms.creatorNaydenov, Boris
dcterms.creatorJelezko, Fedor
dcterms.creatorReithmaier, Johann Peter
dcterms.creatorPopov, Cyril
dcterms.source.identifierISSN 2159-3930
dcterms.source.issueIssue 12
dcterms.source.journalOptical Materials Expresseng
dcterms.source.volumeVol. 9

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