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Linking through-thickness cracks in metallic thin films to in-situ electrical resistance peak broadening

dc.date.accessioned2023-08-02T10:21:47Z
dc.date.available2023-08-02T10:21:47Z
dc.date.issued2022-01-29
dc.identifierdoi:10.17170/kobra-202308018550
dc.identifier.urihttp://hdl.handle.net/123456789/14967
dc.description.sponsorshiphis work was supported by the Austrian Science Fund (FWF) [Project I 4384-N] and the German Research Foundation (DFG) [grant ME-4368/8] within the framework of the D-A-CH cooperation FATIFACE.eng
dc.language.isoeng
dc.rightsNamensnennung 4.0 International*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/*
dc.subjectnanocrystalline metaleng
dc.subjectthin filmseng
dc.subjectfatigueeng
dc.subjectelectrical resistivityeng
dc.subjectthrough-thickness crackseng
dc.subject.ddc620
dc.subject.ddc660
dc.titleLinking through-thickness cracks in metallic thin films to in-situ electrical resistance peak broadeningeng
dc.typeAufsatz
dcterms.abstractMeasurements of electrical resistance have been used extensively as a failure criterion in cyclically loaded conductive films. However, not much research has been performed on extracting additional information contained within such resistance data sets. This study shows that an increase in peak width evidences a transition from cracks bridging to through-thickness crack formation. A Au/Cr bilayer system on a polyimide substrate is used for data generation but the method is applicable to any material system where both necking and through-thickness cracks are formed and no immediate formation of electrically insulating oxide layers occurs upon damage initiation. The method is easy to implement, and has the ability to replace time-intensive and destructive inspection methods.eng
dcterms.accessRightsopen access
dcterms.creatorGebhart, David D.
dcterms.creatorKrapf, Anna
dcterms.creatorGammer, Christoph
dcterms.creatorMerle, Benoit
dcterms.creatorCordill, Megan J.
dc.relation.doidoi:10.1016/j.scriptamat.2022.114550
dc.relation.projectidI 4384-N, ME-4368/8
dc.subject.swdNanostrukturiertes Materialger
dc.subject.swdDünne Schichtger
dc.subject.swdMaterialermüdungger
dc.subject.swdWiderstand <Elektrotechnik>ger
dc.subject.swdRissger
dc.type.versionpublishedVersion
dcterms.source.identifiereissn:1872-8456
dcterms.source.journalScripta Materialia
dcterms.source.volumeVolume 212
kup.iskupfalse
dcterms.source.articlenumber114550


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