Aufsatz
Genetic variability among wheat (Triticum aestivum L.) germplasm for resistance to spot blotch disease
Abstract
Spot blotch caused by Bipolaris sorokiniana (Sacc.) Shoem. is the most devastating disease limiting wheat productivity in warm and humid environments. One hundred and fifty wheat genotypes were evaluated under field conditions in 2013 and 2014 in six different locations in Zambia. The genotypes showed different levels of resistance to spot blotch. Genotypes 19HRWSN6 (Kenya Heroe), 19HRWSN7 (Prontia Federal) and 19HRWSN15 (BRBT2/METSO) were resistant lines across environments. The genotype plus genotype by environment (GGE) biplot grouped the six environments (E) into three mega-environments (ME) with respect to spot blotch severity. ME I contained Golden Valley Agricultural Research Trust (GART) (E6) only. Mpongwe (E4), Mt. Makulu (E5 and E2) and GART (E3) formed ME II, while ME III contained only Mutanda (E1). Genotypes 16HRWYT5, SB50 and 20HRWSN33 were the most susceptible genotypes in ME I, II and III, respectively. Genotype 19HRWSN7 was the most resistant across test locations. The locations in ME III were highly correlated indicating that they provided similar information on genotypes. This suggests that one location could be chosen among the locations in ME III for screening spot blotch resistance each year if the pattern repeats across years. This could aid in reducing the cost of genotype evaluation and improve efficiency as genotypes would be handled in fewer environments.
Citation
In: Journal of Agriculture and Rural Development in the Tropics and Subtropics. Kassel : Kassel University Press. - Vol. 119, No. 1 (2018) S. 85-93Collections
Vol 119, No 1 (2018) (Journal of Agriculture and Rural Development in the Tropics and Subtropics (JARTS))Citation
@article{urn:nbn:de:hebis:34-2018022754656,
author={Tembo, Batiseba and Sibiya, Julia and Tongoona, Pangirayi},
title={Genetic variability among wheat (Triticum aestivum L.) germplasm for resistance to spot blotch disease},
year={2018}
}
0500 Oax 0501 Text $btxt$2rdacontent 0502 Computermedien $bc$2rdacarrier 1100 2018$n2018 1500 1/eng 2050 ##0##urn:nbn:de:hebis:34-2018022754656 3000 Tembo, Batiseba 3010 Sibiya, Julia 3010 Tongoona, Pangirayi 4000 Genetic variability among wheat (Triticum aestivum L.) germplasm for resistance to spot blotch disease / Tembo, Batiseba 4030 4060 Online-Ressource 4085 ##0##=u http://nbn-resolving.de/urn:nbn:de:hebis:34-2018022754656=x R 4204 \$dAufsatz 4170 7136 ##0##urn:nbn:de:hebis:34-2018022754656
2018-06-26T15:25:05Z 2018-06-26T15:25:05Z 2018-06-21 1612-9830 2363-6033 urn:nbn:de:hebis:34-2018022754656 http://hdl.handle.net/123456789/2018022754656 eng Kassel University Press Urheberrechtlich geschützt https://rightsstatements.org/page/InC/1.0/ Bipolaris sorokiniana disease management screening host resistance 630 Genetic variability among wheat (Triticum aestivum L.) germplasm for resistance to spot blotch disease Aufsatz Spot blotch caused by Bipolaris sorokiniana (Sacc.) Shoem. is the most devastating disease limiting wheat productivity in warm and humid environments. One hundred and fifty wheat genotypes were evaluated under field conditions in 2013 and 2014 in six different locations in Zambia. The genotypes showed different levels of resistance to spot blotch. Genotypes 19HRWSN6 (Kenya Heroe), 19HRWSN7 (Prontia Federal) and 19HRWSN15 (BRBT2/METSO) were resistant lines across environments. The genotype plus genotype by environment (GGE) biplot grouped the six environments (E) into three mega-environments (ME) with respect to spot blotch severity. ME I contained Golden Valley Agricultural Research Trust (GART) (E6) only. Mpongwe (E4), Mt. Makulu (E5 and E2) and GART (E3) formed ME II, while ME III contained only Mutanda (E1). Genotypes 16HRWYT5, SB50 and 20HRWSN33 were the most susceptible genotypes in ME I, II and III, respectively. Genotype 19HRWSN7 was the most resistant across test locations. The locations in ME III were highly correlated indicating that they provided similar information on genotypes. This suggests that one location could be chosen among the locations in ME III for screening spot blotch resistance each year if the pattern repeats across years. This could aid in reducing the cost of genotype evaluation and improve efficiency as genotypes would be handled in fewer environments. open access In: Journal of Agriculture and Rural Development in the Tropics and Subtropics. Kassel : Kassel University Press. - Vol. 119, No. 1 (2018) S. 85-93 Tembo, Batiseba Sibiya, Julia Tongoona, Pangirayi Gedruckte Ausg. im Verlag Kassel Univ. Press (www.upress.uni-kassel.de) erschienen.
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