Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays
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In this work, fabrication processes for daylight guiding systems based on micromirror arrays are developed, evaluated and optimized.Two different approaches are used: At first, nanoimprint lithography is used to fabricate large area micromirrors by means of Substrate Conformal Imprint Lithography (SCIL).Secondly,a new lithography technique is developed using a novel bi-layered photomask to fabricate large area micromirror arrays. The experimental results showing a reproducible stable process, high yield, and is consuming less material, time, cost and effort.
@phdthesis{urn:nbn:de:hebis:34-2017011151880, author ={Al-Qargholi, Basim}, title ={Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays}, keywords ={530 and Spiegelsystem and Array and Silicium and Fotoleiter}, copyright ={https://rightsstatements.org/page/InC/1.0/}, language ={en}, school={Kassel, Universität Kassel, Fachbereich Elektrotechnik / Informatik}, year ={2017-01-11} }