Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays
dc.contributor.corporatename | Kassel, Universität Kassel, Fachbereich Elektrotechnik / Informatik | |
dc.contributor.referee | Hillmer, Hartmut (Prof. Dr.) | |
dc.contributor.referee | Bangert, Axel (Prof. Dr.) | |
dc.contributor.referee | Lehmann, Peter (Prof. Dr.) | |
dc.contributor.referee | Witzigmann, Bernd (Prof. Dr.) | |
dc.date.accessioned | 2017-01-11T08:48:44Z | |
dc.date.available | 2017-01-11T08:48:44Z | |
dc.date.examination | 2016-10-20 | |
dc.date.issued | 2017-01-11 | |
dc.identifier.uri | urn:nbn:de:hebis:34-2017011151880 | |
dc.identifier.uri | http://hdl.handle.net/123456789/2017011151880 | |
dc.language.iso | eng | |
dc.rights | Urheberrechtlich geschützt | |
dc.rights.uri | https://rightsstatements.org/page/InC/1.0/ | |
dc.subject | micromirrors | eng |
dc.subject | deposition | eng |
dc.subject | nanoimprint lithography | eng |
dc.subject | bi-layered photomask | eng |
dc.subject | etching | eng |
dc.subject | photoresist | eng |
dc.subject | silicon | eng |
dc.subject | residual layer | eng |
dc.subject.ddc | 530 | |
dc.subject.pacs | Wave propagation in random media | eng |
dc.subject.pacs | Diffraction and scattering | eng |
dc.subject.pacs | Interference | eng |
dc.subject.pacs | Light-sensitive materials | eng |
dc.subject.pacs | Glasses, quartz | eng |
dc.subject.pacs | Visible and ultraviolet sources | eng |
dc.subject.swd | Spiegelsystem | ger |
dc.subject.swd | Array | ger |
dc.subject.swd | Silicium | ger |
dc.subject.swd | Fotoleiter | ger |
dc.title | Development, Evaluation and Optimization of Fabrication Processes for Daylight Guiding Systems Based on Micromirror Arrays | eng |
dc.type | Dissertation | |
dcterms.abstract | In this work, fabrication processes for daylight guiding systems based on micromirror arrays are developed, evaluated and optimized.Two different approaches are used: At first, nanoimprint lithography is used to fabricate large area micromirrors by means of Substrate Conformal Imprint Lithography (SCIL).Secondly,a new lithography technique is developed using a novel bi-layered photomask to fabricate large area micromirror arrays. The experimental results showing a reproducible stable process, high yield, and is consuming less material, time, cost and effort. | eng |
dcterms.accessRights | open access | |
dcterms.alternative | Entwicklung, Evaluierung und Optimierung von Herstellungsprozessen für mikrospiegelbasierte Lichtlenksysteme | ger |
dcterms.creator | Al-Qargholi, Basim |