Datum
2023-02-27Schlagwort
620 Ingenieurwissenschaften 660 Chemische Verfahrenstechnik, Technische Chemie Elektrische EigenschaftElektronisches GerätMetallisierenRissElektrischer LeiterRasterelektronenmikroskopieMaterialermüdungDünne SchichtElektronenrückstreubeugungMetadata
Zur Langanzeige
Aufsatz
Describing mechanical damage evolution through in situ electrical resistance measurements
Zusammenfassung
The fatigue properties of metallizations used as electrical conductors in flexible electronic devices have been thoroughly studied over the years. Most studies use time-intensive characterization methods to evaluate mechanical damage. For their ease of access, in situ electrical resistance measurements are often performed along with other characterization methods. However, the data are mostly used as an indicator of failure and a thorough analysis is usually missing. This work presents some deeper analysis methods of such datasets, using gold films on polyimide, with and without a chromium interlayer, revealing that grain growth, through-thickness cracking, and more general fatigue behavior can be determined from electrical resistance data alone. A case is made for increased utilization of such easily obtained data, reducing the time required for the evaluation of experiments.
Zitierform
In: Journal of Vacuum Science & Technology A Volume 41 / Issue 2 (2023-02-27) eissn:0734-2101Förderhinweis
This work was supported by the Austrian Science Fund (FWF) (Project I, No. 4384-N) and the German Research Foundation (DFG) (No. Grant ME-4368/8) within the framework of the D-A-CH cooperation FATIFACE.Zitieren
@article{doi:10.17170/kobra-202308018551,
author={Gebhart, David D. and Krapf, Anna and Merle, Benoit and Gammer, Christoph and Cordill, Megan J.},
title={Describing mechanical damage evolution through in situ electrical resistance measurements},
journal={Journal of Vacuum Science & Technology A},
year={2023}
}
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2023-08-02T09:51:30Z 2023-08-02T09:51:30Z 2023-02-27 doi:10.17170/kobra-202308018551 http://hdl.handle.net/123456789/14966 This work was supported by the Austrian Science Fund (FWF) (Project I, No. 4384-N) and the German Research Foundation (DFG) (No. Grant ME-4368/8) within the framework of the D-A-CH cooperation FATIFACE. eng Namensnennung 4.0 International http://creativecommons.org/licenses/by/4.0/ electrical properties and parameters electronic devices metallization process cracks electrical resistivity electrical conductor scanning electron microscopy fatigue testing thin films electron backscatter diffraction 620 660 Describing mechanical damage evolution through in situ electrical resistance measurements Aufsatz The fatigue properties of metallizations used as electrical conductors in flexible electronic devices have been thoroughly studied over the years. Most studies use time-intensive characterization methods to evaluate mechanical damage. For their ease of access, in situ electrical resistance measurements are often performed along with other characterization methods. However, the data are mostly used as an indicator of failure and a thorough analysis is usually missing. This work presents some deeper analysis methods of such datasets, using gold films on polyimide, with and without a chromium interlayer, revealing that grain growth, through-thickness cracking, and more general fatigue behavior can be determined from electrical resistance data alone. A case is made for increased utilization of such easily obtained data, reducing the time required for the evaluation of experiments. open access Gebhart, David D. Krapf, Anna Merle, Benoit Gammer, Christoph Cordill, Megan J. doi:10.1116/6.0002362 I 4384-N, ME-4368/8 Elektrische Eigenschaft Elektronisches Gerät Metallisieren Riss Elektrischer Leiter Rasterelektronenmikroskopie Materialermüdung Dünne Schicht Elektronenrückstreubeugung publishedVersion eissn:0734-2101 Issue 2 Journal of Vacuum Science & Technology A Volume 41 false 023408
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